Preparation of TiC/Hard Carbon double layer Films by Plasma CVD Method.
نویسندگان
چکیده
منابع مشابه
Plasma CVD of hydrogenated boron-carbon thin films from triethylboron.
Low-temperature chemical vapor deposition (CVD) of B-C thin films is of importance for neutron voltaics and semiconductor technology. The highly reactive trialkylboranes, with alkyl groups of 1-4 carbon atoms, are a class of precursors that have been less explored for low-temperature CVD of B-C films. Herein, we demonstrate plasma CVD of B-C thin films using triethylboron (TEB) as a single sour...
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ژورنال
عنوان ژورنال: SHINKU
سال: 1992
ISSN: 0559-8516,1880-9413
DOI: 10.3131/jvsj.35.121